Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature-Reference-Cited by-同舟云学术

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Published:2017-10-26 Issue:1 Volume:7 Page:
ISSN:2045-2322
Container-title:Scientific Reports
language:en
Short-container-title:Sci Rep

Author:

Lee Hyung-Ik,Park Jong-Bong,Xianyu Wenxu,Kim Kihong,Chung Jae Gwan,Kyoung Yong Koo,Byun Sunjung,Yang Woo Young,Park Yong Young,Kim Seong Min,Cho Eunae,Shin Jai Kwang

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Link

http://www.nature.com/articles/s41598-017-14291-2.pdf

Reference28 articles.

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5. Yang, Y.-Q. et al. Realization of Thin Film Encapsulation by Atomic Layer Deposition of Al2O3 at Low Temperature. J. Phys. Chem. C 117, 20308–20312 (2013).

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