Heterogeneous complementary field-effect transistors based on silicon and molybdenum disulfide
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Instrumentation,Electronic, Optical and Magnetic Materials
Link
https://www.nature.com/articles/s41928-022-00881-0.pdf
Reference49 articles.
1. Desai, S. B. et al. MoS2 transistors with 1-nanometer gate lengths. Science 354, 99–102 (2016).
2. Wu, F. et al. Vertical MoS2 transistors with sub-1-nm gate lengths. Nature 603, 259–264 (2022).
3. Liao, F. et al. Bioinspired in-sensor visual adaptation for accurate perception. Nat. Electron. 5, 84–91 (2022).
4. Liu, C. et al. Small footprint transistor architecture for photoswitching logic and in situ memory. Nat. Nanotechnol. 14, 662–667 (2019).
5. Mennel, L. et al. Ultrafast machine vision with 2D material neural network image sensors. Nature 579, 62–66 (2020).
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