Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001)
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/srep08947.pdf
Reference31 articles.
1. Zhou, L., Audurier, V., Pirouz, P. & Powell, J. A. Chemomechanical polishing of silicon carbide. J. Electrochem. Soc. 144, L161–L163 (1997).
2. Neslen, C. L., Mitchel, W. C. & Hengehold, R. L. Effects of process parameter variations on the removal rate in chemical mechanical polishing of 4H-SiC. J. Electron. Mater. 30, 1271–1275 (2001).
3. Aida, H. et al. Ultraprecision CMP for sapphire, GaN and SiC for advanced optoelectronics Materials. Curr. Appl. Phys. 12, S41–S46 (2012).
4. Hara, H. et al. Novel abrasive-free planarization of 4H-SiC (0001) using catalyst. J. Electron. Mater. 35, L11–L14 (2006).
5. Okamoto, T. et al. Dependence of process characteristics on atomic-step density in catalyst-referred etching of 4H–SiC (0001) surface. J. Nanosci. Nanotech. 11, 2928–2930 (2011).
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