Annealing-induced interfacial toughening using a molecular nanolayer-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Annealing-induced interfacial toughening using a molecular nanolayer

Published:2007-05 Issue:7142 Volume:447 Page:299-302
ISSN:0028-0836
Container-title:Nature
language:en
Short-container-title:Nature

Author:

Gandhi Darshan D.,Lane Michael,Zhou Yu,Singh Amit P.,Nayak Saroj,Tisch Ulrike,Eizenberg Moshe,Ramanath Ganapathiraman

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Link

http://www.nature.com/articles/nature05826.pdf

Reference28 articles.

1. Qian, L., Tian, F. & Xiao, X. Tribological properties of self-assembled monolayers and their substrates under various humid environments. Tribol. Lett. 15, 169– 176 (2003)

2. Yang, X. M., Peters, R. D., Kim, T. K. & Nealey, P. F. Proximity X-ray lithography using self-assembled alkylsiloxane films: Resolution and pattern transfer. Langmuir 17, 228– 233 (2001)

3. Dressick, W. J. & Calvert, J. M. Patterning of self-assembled films using lithographic exposure tools. Jpn. J. Appl. Phys. 32, 5829– 5839 (1993)

4. Kuther, J. & Tremel, W. Template induced crystallization of biominerals on self-assembled monolayers of alkylthiols. Thin Solid Films 327–329, 554– 558 (1998)

5. Halik, M. et al. Low-voltage organic transistors with an amorphous molecular gate dielectric. Nature 431, 963– 966 (2004)

Cited by 124 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A healable amino silane self-assembled monolayer incorporating polymer capped palladium nanoclusters and its application as the copper diffusion barrier layer on silicon wafer;Next Materials;2024-07

2. Strain hardening and toughening in metal/molecular nanolayer/metal nanosandwiches;Applied Physics Letters;2024-06-24

3. Nanomolecularly-induced Effects at Titania/Organo-Diphosphonate Interfaces for Stable Hybrid Multilayers with Emergent Properties;ACS Applied Nano Materials;2024-05-03

4. CuTi as Potential Liner- and Barrier-Free Interconnect Conductor;IEEE Transactions on Electron Devices;2024-05

5. Simultaneous Reduction of Bulk and Contact Thermal Resistance in High‐Loading Thermal Interface Materials Using Self‐Assembled Monolayers;Advanced Functional Materials;2024-04-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3