DNA Origami Mask for Sub-Ten-Nanometer Lithography
Author:
Affiliation:
1. University Grenoble Alpes, F-38000 Grenoble, France
2. CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
3. CEA, INAC, MINATEC Campus, F-38000 Grenoble, France
Funder
Commissariat a l'Energie Atomique et aux Energies Alternatives
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.6b00413
Reference29 articles.
1. ITRS lithography roadmap: 2015 challenges
2. Scaling-down lithographic dimensions with block-copolymer materials: 10nmsized features with PS-b-PMMA
3. PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications
4. Folding DNA to create nanoscale shapes and patterns
5. Three-Dimensional Structures Self-Assembled from DNA Bricks
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