High-Resolution Functional Epoxysilsesquioxane-Based Patterning Layers for Large-Area Nanoimprinting
Author:
Affiliation:
1. Macromolecular Science and Engineering
2. and Department of Electrical Engineering and Computer Science, The University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109
3. Dow Corning Corporation, Midland, Michigan 48686
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn100478a
Reference50 articles.
1. Unconventional Nanopatterning Techniques and Applications
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5. Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography
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