Imprint Lithography with 25-Nanometer Resolution
Author:
Affiliation:
1. NanoStructure Laboratory, Department of Electrical Engineering, University of Minnesota, Minneapolis, MN 55455, USA.
Publisher
American Association for the Advancement of Science (AAAS)
Subject
Multidisciplinary
Reference10 articles.
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2. EARLY K, MICROELECTRON ENG 11, 317 (1990).
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4. REPLICATION OF 175-A LINES AND SPACES IN POLYMETHYLMETHACRYLATE USING X-RAY-LITHOGRAPHY;FLANDERS D.C.;APPLIED PHYSICS LETTERS,1980
5. HARMENING M, MICROELECTROMECHANIC: 202 (1992).
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