Imprint Lithography with 25-Nanometer Resolution

Author:

Chou Stephen Y.1,Krauss Peter R.1,Renstrom Preston J.1

Affiliation:

1. NanoStructure Laboratory, Department of Electrical Engineering, University of Minnesota, Minneapolis, MN 55455, USA.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

Reference10 articles.

1. 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST;BROERS A.N.;APPLIED PHYSICS LETTERS,1978

2. EARLY K, MICROELECTRON ENG 11, 317 (1990).

3. 10-NM ELECTRON-BEAM LITHOGRAPHY AND SUB-50-NM OVERLAY USING A MODIFIED SCANNING ELECTRON-MICROSCOPE;FISCHER P.B.;APPLIED PHYSICS LETTERS,1993

4. REPLICATION OF 175-A LINES AND SPACES IN POLYMETHYLMETHACRYLATE USING X-RAY-LITHOGRAPHY;FLANDERS D.C.;APPLIED PHYSICS LETTERS,1980

5. HARMENING M, MICROELECTROMECHANIC: 202 (1992).

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