Influence of Initial Film Properties in UVO-Mediated Patterning of an Elastomeric Film Using a TEM Grid-Reference-Cited by-同舟云学术

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Influence of Initial Film Properties in UVO-Mediated Patterning of an Elastomeric Film Using a TEM Grid

Published:2024-08-12 Issue: Volume: Page:
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Ritanjali Sushree Ritu¹,Bhandaru Nandini²^ORCID,Mukherjee Rabibrata¹^ORCID

Affiliation:

1. Instability and Soft Patterning Laboratory, Department of Chemical Engineering, Indian Institute of Technology Kharagpur, Kharagpur, West Bengal 721-302, India

2. Department of Chemical Engineering, Birla Institute of Technology and Science Pilani, Hyderabad Campus, Telangana 500-078, India

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.4c00509

Reference42 articles.

1. Soft-Contact Optical Lithography Using Transparent Elastomeric Stamps and Application to Nanopatterned Organic Light-Emitting Devices

2. Organic Microcavity Photodiodes

3. Plastic Solar Cells

4. Conducting Polymers with Confined Dimensions: Track-Etch Membranes for Amperometric Biosensor Applications

5. Fabrication of microfluidic systems in poly(dimethylsiloxane)

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