Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography-Reference-Cited by-同舟云学术

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Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography

Published:2005-07-22 Issue:9 Volume:16 Page:1874-1877
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Ahn Seh-Won,Lee Ki-Dong,Kim Jin-Sung,Kim Sang Hoon,Park Joo-Do,Lee Sarng-Hoon,Yoon Phil-Won

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/16/i=9/a=076/pdf

Reference8 articles.

1. Optical wire-grid polarizers at oblique angles of incidence

2. Large-area achromatic interferometric lithography for 100 nm period gratings and grids

3. Imprint of sub‐25 nm vias and trenches in polymers

4. Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

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