Pressure-Dependent Growth of Wafer-Scale Few-layer h-BN by Metal–Organic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Pressure-Dependent Growth of Wafer-Scale Few-layer h-BN by Metal–Organic Chemical Vapor Deposition

Published:2017-03-30 Issue:5 Volume:17 Page:2569-2575
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Kim Dong Yeong¹^ORCID,Han Nam¹,Jeong Hokyeong¹,Kim Jaewon¹,Hwang Sunyong¹,Song Kyung²,Choi Si-Young²,Kim Jong Kyu¹

Affiliation:

1. Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea

2. Materials Modeling and Characterization Department, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea

Funder

Samsung Research Funding Center

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.cgd.7b00107

Reference35 articles.

1. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides

2. Progress, Challenges, and Opportunities in Two-Dimensional Materials Beyond Graphene

3. Nano boron nitride flatland

4. Recent development in 2D materials beyond graphene

5. 2D materials and van der Waals heterostructures

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Films;Advanced Materials Interfaces;2024-04-19

2. Conformal Growth of Hexagonal Boron Nitride on High-Aspect-Ratio Silicon-Based Nanotrenches;Chemistry of Materials;2023-03-14

3. Effect of the Growth Interruption on the Surface Morphology and Crystalline Quality of MOCVD-Grown h-BN;Crystals;2023-03-11

4. Growth of Two‐Dimensional Materials at the Wafer Scale;Advanced Materials;2021-12-03

5. Van der Waals Heterostructure of Hexagonal Boron Nitride with an AlGaN/GaN Epitaxial Wafer for High-Performance Radio Frequency Applications;ACS Applied Materials & Interfaces;2021-11-18

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3