Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films
Author:
Affiliation:
1. Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, Estonia
Funder
European Regional Development Fund
Eesti Teadusagentuur
Publisher
American Chemical Society (ACS)
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.cgd.1c00471
Reference59 articles.
1. Low-Temperature Al2O3 Atomic Layer Deposition
2. Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition
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