Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition-Reference-Cited by-同舟云学术

Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition

Published:2008-03-01 Issue:12 Volume:112 Page:4573-4580
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Dameron Arrelaine A.¹,Davidson Stephen D.¹,Burton Beau B.¹,Carcia Peter F.¹,McLean R. Scott¹,George Steven M.¹

Affiliation:

1. Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309, DuPont Central Research and Development, Wilmington, Delaware 19803, and Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp076866%2B

Reference44 articles.

1. Reliability and degradation of organic light emitting devices

2. Thin-Film Permeation-Barrier Technology for Flexible Organic Light-Emitting Devices

3. Investigation of the sites of dark spots in organic light-emitting devices

4. Organic light-emitting devices with extended operating lifetimes on plastic substrates

5. Ultra barrier flexible substrates for flat panel displays

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