Selective Area Spatial Atomic Layer Deposition of ZnO, Al2O3, and Aluminum-Doped ZnO Using Poly(vinyl pyrrolidone)
Author:
Affiliation:
1. Eastman Kodak Company, 1999 Lake Ave., Rochester, New York 14650, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm402464z
Reference29 articles.
1. Metal-oxide thin-film transistors patterned by printing
2. Oxide Electronics by Spatial Atomic Layer Deposition
3. ZnO Thin-Film Transistor Ring Oscillators with 31-ns Propagation Delay
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