Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

Author:

Vale João Pedro12ORCID,Sekkat Abderrahime34ORCID,Gheorghin Thomas3,Sevim Semih5ORCID,Mavromanolaki Eirini6,Flouris Andreas D.78,Pané Salvador5ORCID,Muñoz-Rojas David3,Puigmartí-Luis Josep910ORCID,Sotto Mayor Tiago12ORCID

Affiliation:

1. Transport Phenomena Research Centre (CEFT), Engineering Faculty of Porto University, Rua Dr Roberto Frias, 4200-465 Porto, Portugal

2. Associate Laboratory in Chemical Engineering (ALiCE), Engineering Faculty of Porto University, Rua Dr Roberto Frias, 4200-465 Porto, Portugal

3. Université Grenoble Alpes, CNRS, Grenoble INP, LMGP, 38000 Grenoble, France

4. Laboratoire de Génie Chimique, Université de Toulouse, CNRS, 31013 Toulouse, France

5. Multi-Scale Robotics Lab, Institute of Robotics and Intelligent Systems, ETH Zurich, Tannenstrasse 3, CH-8092 Zurich, Switzerland

6. Creative Nano PC, 14451 Athens, Greece

7. Discovery Foundation, 70300 Heraklion, Crete, Greece

8. FAME Laboratory, Department of Physical Education and Sport Science, University of Thessaly, 38221 Volos, Greece

9. Departament de Ciència Dels Materials i Química Física, Institut de Química Teòrica i Computacional, University of Barcelona (UB), 08028 Barcelona, Spain

10. Institució Catalana de Recerca i Estudis Avançats (ICREA), Pg. Lluís Companys 23, 08010 Barcelona, Spain

Funder

Agencia Estatal de Investigación

Ministério da Ciência, Tecnologia e Ensino Superior

Horizon 2020 Framework Programme

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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