Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing
Author:
Affiliation:
1. Department of Applied Chemistry, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan
2. Center for Emergent Functional Matter Science, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan
Funder
National Science and Technology Council
Ministry of Education, Taiwan
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.3c03752
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1. Reactive Vapor-Phase Inhibitors for Area-Selective Depositions at Tunable Critical Dimensions;ACS Applied Materials & Interfaces;2024-01-11
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