Reactive Bond-Order Potential for Si-, C-, and H-Containing Materials
Author:
Affiliation:
1. Department of Mechanical Engineering, Oakland University, Rochester, Michigan 48309, United States
2. Department of Chemistry, United States Naval Academy, Annapolis, Maryland 21402, United States
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp3074688
Reference68 articles.
1. Growth Mechanism and Chemical Structure of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 1
2. Properties of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 2
3. Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings
4. Remote Hydrogen Plasma Chemical Vapor Deposition of Amorphous Hydrogenated Silicon-Carbon Films from an Organosilane Molecular Cluster as a Novel Single-Source Precursor: Structure, Growth Mechanism, and Properties of the Deposit
5. Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Molecular dynamics study on thermal conductance between a nanotip and a substrate under vertical forces and horizontal sliding;Physical Chemistry Chemical Physics;2023
2. Molecular Dynamics Examination of Sliding History-Dependent Adhesion in Si–Si Nanocontacts: Connecting Friction, Wear, Bond Formation, and Interfacial Adhesion;Tribology Letters;2021-04-09
3. Horizons of modern molecular dynamics simulation in digitalized solid freeform fabrication with advanced materials;Materials Today Chemistry;2020-12
4. Effect of interatomic potentials on modeling the nanostructure of amorphous carbon by liquid quenching method;Computational Materials Science;2020-11
5. Review of force fields and intermolecular potentials used in atomistic computational materials research;Applied Physics Reviews;2018-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3