Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings-Reference-Cited by-同舟云学术

Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings

Published:2010-03 Issue:3 Volume:24 Page:201-207
ISSN:0268-2605
Container-title:Applied Organometallic Chemistry
language:en
Short-container-title:Appl. Organometal. Chem.

Author:

Wrobel A. M.,Walkiewicz-Pietrzykowska A.,Blaszczyk-Lezak I.

Publisher

Wiley

Subject

Inorganic Chemistry,General Chemistry

Reference35 articles.

1. A covalent micro/nano-composite resistant to high-temperature oxidation

2. Silicon Carbide

3. Low-stress silicon carbonitride for the machining of high-frequency nanomechanical resonators

4. Silicon carbonitride: a rival to cubic boron nitride

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process;The Journal of Physical Chemistry A;2023-10-26

2. 1,4-Bis(trimethylsilyl)piperazine—Thermal Properties and Application as CVD Precursor;Coatings;2023-06-05

3. Theoretical Study on the Decomposition Kinetics and Thermochemistry of Tetramethyldisilazane and Hexamethyldisilazane─Formation of Silanimine and Silene Species;The Journal of Physical Chemistry A;2022-10-31

4. An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine;Chemical Engineering Journal;2022-03

5. Challenges in the Electrochemical Synthesis of Si 2 Cl 6 Starting from Tetrachlorosilane and Trichlorosilane;ChemElectroChem;2022-01-03