Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition—Defectivity Reduction by Monolayer Design
Author:
Affiliation:
1. International Business Machines—Almaden Research Center, 650 Harry Rd., San Jose, California 95110, United States
2. International Business Machines—Semiconductor Technology Research, 257 Fuller Rd., Albany, New York 12203, United States
Funder
International Business Machines Corporation
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.8b13896
Reference25 articles.
1. Bower, R. W.; Dill, R. G. Insulated Gate Field Effect Transistors Fabricated Using the Gate as Source–Drain Mask. 1966 International Electron Devices Meeting, 1966; Vol. 12, pp 102–103.
2. Bangsaruntip, S.; High Performance and Highly Uniform Gate-All-Around Silicon Nanowire MOSFETs with Wire Size Dependent Scaling. 2009 IEEE International Electron Devices Meeting (IEDM), 2009; pp 297–300.
3. A million spiking-neuron integrated circuit with a scalable communication network and interface
4. Memristive neural network for on-line learning and tracking with brain-inspired spike timing dependent plasticity
5. A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal–Dielectric Patterns
Cited by 41 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs);Applied Surface Science;2024-08
2. Reactive Vapor-Phase Inhibitors for Area-Selective Depositions at Tunable Critical Dimensions;ACS Applied Materials & Interfaces;2024-01-11
3. Thermal Stability and Orthogonal Functionalization of Organophosphonate Self-Assembled Monolayers as Potential Liners for Cu Interconnect;ACS Omega;2023-10-13
4. Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition;Chemistry of Materials;2023-07-22
5. Effect of Heat and Plasma Treatment on Carboranethiol Self-Assembled Monolayers on Copper;The Journal of Physical Chemistry C;2023-06-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3