Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine
Author:
Affiliation:
1. Department of Nanotechnology and Advanced Material Engineering, Sejong University, Seoul 05006, Republic of Korea
2. R&D Division, Jusung Engineering, Gwangju, Gyeonggi-do 12773, Republic of Korea
Funder
Korea Evaluation Institute of Industrial Technology
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.8b00147
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