1. Moore, G.E., Electronics, 1965, vol. 38, no. 8, p. 114.
2. http://www.itrs.com
3. Manos, D.M. and Flamm, D.L., Plasma Etching: An Introduction, New York: Academic, 1989.
4. Winters, H.W. and Coburn, J.W., Surf. Sci. Rep., 1992, vol. 14, nos. 4–6, p. 161.
5. Wilk, G.D., Wallace, R.M., and Anthony, J.M., J. Appl. Phys., 2001, vol. 89, no. 10, p. 5243.