Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles
Author:
Affiliation:
1. Kagami Memorial Research Institute for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan
Funder
Ministry of Education, Culture, Sports, Science and Technology
Strategic International Collaborative Research Program
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b03777
Reference36 articles.
1. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
2. Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
3. Directed self-assembly of block copolymers for nanocircuitry fabrication
4. Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography
5. Bending of Lamellar Microdomains of Block Copolymers on Nonselective Surfaces
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1. Alcohol-induced deboronation of organoborosilicate thin films;Journal of Sol-Gel Science and Technology;2022-07-14
2. Interfacial Self‐Assembly of Closely Packed Nanoparticle Arrays of Silica@Multiporphyrin Hybrids as Light‐Sensitizers for Dye Degradation and Viologen Photochromism;Chemistry – An Asian Journal;2019-08-13
3. Fabrication of Uniaxially Aligned Silica Nanogrooves with Sub-5 nm Periodicity on Centimeter-Scale Si Substrate Using Poly(dimethylsiloxane) Stamps;ACS Nano;2019-01-09
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