Ultrathin ZnS and ZnO Interfacial Passivation Layers for Atomic-Layer-Deposited HfO2 Films on InP Substrates
Author:
Affiliation:
1. Department of Energy Engineering, Dankook University, Cheonan 31116, Korea
Funder
National Research Foundation of Korea
Ministry of Trade, Industry and Energy
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.6b06643
Reference32 articles.
1. Surface Charge Transfer Doping of III–V Nanostructures
2. Atomic Layer Deposition of Dielectrics on Ge and III–V Materials for Ultrahigh Performance Transistors
3. Nanometre-scale electronics with III–V compound semiconductors
4. Surface Passivation and Interface Properties of Bulk GaAs and Epitaxial-GaAs/Ge Using Atomic Layer Deposited TiAlO Alloy Dielectric
5. Nanoscale InGaSb Heterostructure Membranes on Si Substrates for High Hole Mobility Transistors
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Enhancement of Cd‐Free All‐Dry‐Processed Cu(In1‐x,Gax)Se2 Thin‐Film Solar Cells by Simultaneous Adoption of an Enlarged Bandgap Absorber and Tunable Bandgap Zn1‐xMgxO Buffer;ENERGY & ENVIRONMENTAL MATERIALS;2024-08-14
2. Adhesive-free bonding for hetero-integration of InP based coupons micro-transfer printed on SiO2 into Complementary Metal-Oxide-Semiconductor backend for Si photonics application on 8″ wafer platform;Thin Solid Films;2024-06
3. Modification of Interface Quality and Electrical Performance of ErSmO/InP Gate-Stacks by ALD-Driven HfAlO$_{\textit{x}}$ Interlayers;IEEE Transactions on Electron Devices;2024
4. Electrical Performance Determination and Stress Reliability Estimation of ALD- Derived Er2O3/InP Heterointerface;IEEE Transactions on Electron Devices;2023-12
5. Interface State Density Modification and Dielectric Reliability Enhancement of ErTixOy/Al2O3/InP Laminated Stacks;IEEE Transactions on Electron Devices;2023-04
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3