A DFT Study of the Al2O3 Atomic Layer Deposition on SAMs: Effect of SAM Termination
Author:
Affiliation:
1. Departments of Materials Science and Engineering and Chemical Engineering, Stanford University, Stanford, California 94305-5025
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm035009p
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