Effect of water dose on the atomic layer deposition rate of oxide thin films-Reference-Cited by-同舟云学术

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Effect of water dose on the atomic layer deposition rate of oxide thin films

Published:2000-06 Issue:1 Volume:368 Page:1-7
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Matero Raija,Rahtu Antti,Ritala Mikko,Leskelä Markku,Sajavaara Timo

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Atomic layer epitaxy

2. Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

3. Advanced ALE processes of amorphous and polycrystalline films

4. Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

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