Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn101616d
Reference36 articles.
1. Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes
2. Patterning with block copolymer thin films
3. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
4. Ordering in thin films of block copolymers: Fundamentals to potential applications
5. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics
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