Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces-Reference-Cited by-同舟云学术

Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

Published:2020-04-29 Issue:20 Volume:12 Page:23399-23409
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Kim Ji Yeon¹^ORCID,Liu Philip¹,Maher Michael J.²³⁴^ORCID,Callan Devon H.¹^ORCID,Bates Christopher M.²^ORCID,Carlson Matthew C.¹⁴,Asano Yusuke²,Blachut Gregory¹^ORCID,Rettner Charles T.³,Cheng Joy Y.³,Sunday Daniel F.⁵^ORCID,Kline R. Joseph⁵,Sanders Daniel P.³,Lynd Nathaniel A.¹^ORCID,Ellison Christopher J.⁴,Willson C. Grant¹²^ORCID,Baiz Carlos R.²^ORCID

Affiliation:

1. McKetta Department of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, United States

2. Department of Chemistry, University of Texas at Austin, Austin, Texas 78712, United States

3. IBM Research - Almaden, 650 Harry Road, San Jose, California 95120, United States

4. Department of Chemical Engineering and Material Science, University of Minnesota Twin Cities, Minneapolis, Minnesota 55455, United States

5. Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States

Funder

Division of Chemistry

Welch Foundation

National Institute of Standards and Technology

Division of Graduate Education

Division of Engineering Education and Centers

University of Texas at Austin

National Science Foundation

School of Electronic Engineering and Computer Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c02997

Reference71 articles.

1. Block Copolymer Lithography

2. Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication

3. Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy

4. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns

5. A Generalized Approach to the Modification of Solid Surfaces

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