Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication
Author:
Affiliation:
1. Department of Chemical & Biomolecular Engineering, University of Delaware, Newark, Delaware 19716, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma401112y
Reference169 articles.
1. Ordered Arrays of 〈100〉-Oriented Silicon Nanorods by CMOS-Compatible Block Copolymer Lithography
2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
3. Using Cylindrical Domains of Block Copolymers To Self-Assemble and Align Metallic Nanowires
4. Nanowire Conductive Polymer Gas Sensor Patterned Using Self-Assembled Block Copolymer Lithography
5. Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers
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