Quantitative Structure and Property Analysis of Nanoporous Low Dielectric Constant SiCOH Thin Films-Reference-Cited by-同舟云学术

Quantitative Structure and Property Analysis of Nanoporous Low Dielectric Constant SiCOH Thin Films

Published:2007-06-28 Issue:29 Volume:111 Page:10848-10854
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Heo Kyuyoung¹,Park Sung-Gyu¹,Yoon Jinhwan¹,Jin Kyeong Sik¹,Jin Sangwoo¹,Rhee Shi-Woo¹,Ree Moonhor¹

Affiliation:

1. Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK21 Program, Pohang University of Science and Technology, Pohang 790-784, Republic of Korea, and Department of Chemical Engineering and National Research Lab of Materials and Processes for New Memory, Pohang University of Science and Technology, Pohang 790-784, Republic of Korea

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp072125x

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