Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis-Reference-Cited by-同舟云学术

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Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis

Published:2024-07-11 Issue:8 Volume:35 Page:1786-1796
ISSN:1044-0305
Container-title:Journal of the American Society for Mass Spectrometry
language:en
Short-container-title:J. Am. Soc. Mass Spectrom.

Author:

Watzek Malte¹²,Sturm Patrick¹,Stoermer Carsten¹,Bensaoula Abdelhak¹,Nelis Thomas²³,Hain Caroline²³^ORCID

Affiliation:

1. TOFWERK AG, Schorenstrasse 39, 3645 Thun, Switzerland

2. Institute for Applied Laser, Photonics and Surface Technologies, BFH, Bern University of Applied Sciences, Quellgasse 21, 2502 Biel/Bienne, Switzerland

3. Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland

Funder

European Commission

Innosuisse - Schweizerische Agentur f?r Innovationsf?rderung

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/jasms.4c00140

Reference59 articles.

1. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

2. A structure zone diagram including plasma-based deposition and ion etching

3. Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

4. From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films

5. Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

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