Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation-Reference-Cited by-同舟云学术

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Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Published:2023-02 Issue: Volume:454 Page:129188
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hain Caroline,Schweizer Peter,Sturm Patrick,Borzì Aurelio,Thomet Jonathan E.,Michler Johann,Hessler-Wyser Aïcha,Nelis Thomas

Funder

European Commission

Bern University of Applied Sciences

Innosuisse - Schweizerische Agentur für Innovationsförderung

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference43 articles.

1. Reactive Sputter Deposition;Depla,2008

2. Tutorial: reactive high power impulse magnetron sputtering (R-HiPIMS);Anders;J. Appl. Phys.,2017

3. Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation;Güttler;Appl. Phys. Lett.,2004

4. Magnetron sputter deposition: linking discharge voltage with target properties;Depla;Thin Solid Films,2009

5. Origin of the delayed current onset in high-power impulse magnetron sputtering;Yushkov;IEEE Trans. Plasma Sci.,2010

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1. Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis;Journal of the American Society for Mass Spectrometry;2024-07-11

2. Simulation and experimental study of InN nanoparticles synthesized by ion implantation technology;Journal of Molecular Modeling;2024-07

3. Microstructure and mechanical properties of Ti-Nb alloys: comparing conventional powder metallurgy, mechanical alloying, and high power impulse magnetron sputtering processes for supporting materials screening;Journal of Materials Science;2024-05

4. Nanostructure and Optical Property Tailoring of Zinc Tin Nitride Thin Films through Phenomenological Decoupling: A Pathway to Enhanced Control;ACS Applied Nano Materials;2024-03-11

5. Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering;Advanced Engineering Materials;2024-02-13

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