Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures-Reference-Cited by-同舟云学术

Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

Published:2014-01 Issue: Volume:550 Page:264-267
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ait Aissa K.,Achour A.,Camus J.,Le Brizoual L.,Jouan P.-Y.,Djouadi M.-A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Effect of Cr implantation on structural and optical properties of AlN thin films

2. Hexagonal c-axis GaN layers grown by metalorganic vapor-phase epitaxy on Si(001)

3. Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering

4. Diamond - Application to piezoelectric bimorph cantilever sensors

5. Properties of AlN films grown at 350 K by gas‐phase excimer laser photolysis

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