Achieving Compact Structure and Good Mechanical Properties of AlN Thin Film through Low Temperature HiPIMS-Reference-Cited by-同舟云学术

Achieving Compact Structure and Good Mechanical Properties of AlN Thin Film through Low Temperature HiPIMS

Published:2023-08-28 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE Regional Symposium on Micro and Nanoelectronics (RSM)
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Author:

Azman Zulkifli¹,Nayan Nafarizal²,Soon Chin Fong²,Bakar Ahmad Shuhaimi Abu³,Mohamed Ahmad Nasrull²,Sahari Norain⁴,Wijaya Yusmar Palapa⁵,Yazid Ahmad Mohd⁶

Affiliation:

1. Universiti Tun Hussein Onn Malaysia,Faculty of Electrical and Electronic,Batu Pahat,Malaysia

2. Universiti Tun Hussein Onn Malaysia,Microelectronics and Nanotechnology-Shamsuddin Research Centre,Batu Pahat,Malaysia

3. Universiti Malaya,Low Dimensional Material Research Centre,Kuala Lumpur,Malaysia

4. Universiti Tun Hussein Onn Malaysia,Faculty of Engineering Technology,Pagoh,Malaysia

5. Politeknik Caltex Riau,Department of Electronic System Engineering,Pekanbaru,Indonesia

6. Nanorian Technologies Sdn Bhd,Kajang,Malaysia

Funder

Ministry of Higher Education

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10326449/10326731/10327329.pdf?arnumber=10327329

Reference20 articles.

1. Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

2. An introduction to thin film processing using high-power impulse magnetron sputtering

3. Substrate Temperature Dependent Properties of Sputtered AlN : Er Thin Film for In-Situ Luminescence;fang,2018

4. Plasma damage control via adjusting the target to substrate distance used to prepare semi-transparent perovskite solar cells

5. Influence of high power impulse magnetron sputtering pulse parameters on the properties of aluminum nitride coatings