Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
Author:
Affiliation:
1. Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea, and Research & Development division, Hynix Semiconductor Incorporation, Ichon 467-701, Korea
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm803369b
Reference36 articles.
1. Lam, C.Presented atNew non-volatile memory workshop 2007, Hsinchu, Taiwan, November 2007, (unpublished).
2. Hudgens, S.Presented atIEEE Non-volatile semiconductor memory workshop 2007, Monterey, CA, August 2007, (unpublished).
3. Cyclic PECVD of Ge[sub 2]Sb[sub 2]Te[sub 5] Films Using Metallorganic Sources
4. Combined Atomic Layer and Chemical Vapor Deposition, and Selective Growth of Ge2Sb2Te5 Films on TiN/W Contact Plug
Cited by 52 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Process-Induced Modulation of Domain Orientations during WS2 Epitaxy by Metal–Organic Chemical Vapor Deposition on Sapphire;ACS Applied Electronic Materials;2024-09-04
2. Direct Growth of Bi2SeO5 Thin Films for High-k Dielectrics via Atomic Layer Deposition;ACS Nano;2024-08-05
3. Exploring the effects of substrate and substrate temperature on the properties of radio frequency magnetron sputtered ZnO thin films;Materials Today Communications;2023-08
4. Elemental Redistribution During the Crystallization of Ge–Cu–Te Thin Films for Phase-Change Memory;ECS Journal of Solid State Science and Technology;2023-01-01
5. Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen;Chemistry of Materials;2022-02-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3