Pyrolysis of Tetraethoxysilane on Mo(100) at Low Temperatures
Author:
Affiliation:
1. Department of Chemical Engineering, University of Washington, Seattle, Washington 98195-1750
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp971098f
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1. Low-pressure deposition of high-quality SiO2 films by pyrolysis of tetraethylorthosilicate
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3. Alkaline-earth-metal antimonides and bismuthides with the A5Pn3 stoichiometry. Interstitial and other Zintl phases formed on their reactions with halogen or sulfur
4. Reactions of alkoxysilanes on metal oxide surfaces: decomposition of tetraethoxysilane on MgO(100) and Al2O3(0001)
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