Reactions of alkoxysilanes on metal oxide surfaces: decomposition of tetraethoxysilane on MgO(100) and Al2O3(0001)
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
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2. Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2
3. Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO2surfaces
4. Pathways and intermediates in the reaction of tetraethoxysilane on silicon(100)-2 .times. 1
5. Preparation of SiO2 overlayers on oxide substrates by chemical vapor deposition of Si(OC2H5)4
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