Improving Area-Selective Molecular Layer Deposition by Selective SAM Removal
Author:
Affiliation:
1. Department of Chemical Engineering and ‡Department of Material Science and Engineering, Stanford University, Stanford, California 94305-5025, United States
Funder
Semiconductor Research Corporation
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am504441e
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