Surface Reactivity of CF2 Radicals Measured Using Laser-Induced Fluorescence and C2F6 Plasma Molecular Beams
Author:
Affiliation:
1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp972434v
Reference37 articles.
1. Polymer deposition and etching mechanisms in C2F6 radio-frequency plasma as studied by laser-induced fluorescence
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4. Plasma homo- and copolymerizations of tetrafluoroethylene and chlorotrifluoroethylene
5. Reactions of laser-generated CF2 on silicon and silicon oxide surfaces
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