Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4828397
Reference59 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Dual excitation reactive ion etcher for low energy plasma processing
3. Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors
4. Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux
5. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
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1. The optical emission spectroscopy of nitrogen plasma driven by the 94.92 MHz/13.56 MHz dual-frequency;Physics Letters A;2020-04
2. Optical properties of the atmospheric pressure helium plasma jet generated by alternative current (a.c.) power supply;Physics of Plasmas;2016-05
3. Structural Properties of Buffer and Complex Plasmas in RF Gas Discharge-Imposed Electrostatic Field;IEEE Transactions on Plasma Science;2016-04
4. An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas;Journal of Applied Physics;2015-01-14
5. Absolute CF2 density and gas temperature measurements by absorption spectroscopy in dual-frequency capacitively coupled CF4/Ar plasmas;Physics of Plasmas;2014-10
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