Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas-Reference-Cited by-同舟云学术

Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas

Published:1997-01-01 Issue:1 Volume:9 Page:349-362
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Mackie Neil M.¹,Dalleska N. F.¹,Castner David G.¹,Fisher Ellen R.¹

Affiliation:

1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523, and National ESCA and Surface Analysis Center for Biomedical Problems, Department of Chemical Engineering, Box 351750, University of Washington, Seattle, Washington 98195

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm960388q

Reference54 articles.

1. Polymer deposition and etching mechanisms in C2F6 radio-frequency plasma as studied by laser-induced fluorescence

2. Polymer film formation in C2F6H2 discharges

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