Surfactant-Catalyzed Chemical Vapor Deposition of Copper Thin Films
Author:
Affiliation:
1. School of Chemical Engineering, Seoul National University, Sinrim san 56-1, Kwanak-gu, Seoul 151-742, Korea
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm990805%2B
Reference28 articles.
1. Multilevel interconnections for ULSI and GSI era
2. Chemical Vapor Deposition of Copper for Advanced On-Chip Interconnects
3. The Chemistry of Metal CVD
4. Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation
5. The chemistry of β-diketonate copper(I) compounds—III. The synthesis of (β-diketonate) Cu(1,5-COD) compounds, the solid state structure and disproportionation of hexafluoroacetylacetonato (1,5-cyclooctadiene)copper(I), (hfac)Cu(1,5-COD)
Cited by 41 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Porous Membranes as Sacrificial Layers Enabling Conformal Chemical Vapor Deposition Involving Multiple Film-Forming Species;ACS Applied Materials & Interfaces;2020-10-30
2. Atomic layer deposition of metals: Precursors and film growth;Applied Physics Reviews;2019-12
3. Trends in Copper Precursor Development for CVD and ALD Applications;ECS Journal of Solid State Science and Technology;2014-12-09
4. SiC coatings grown by liquid injection chemical vapor deposition using single source metal-organic precursors;Surface and Coatings Technology;2013-01
5. CVD of pure copper films from novel iso-ureate complexes;Dalton Transactions;2013
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3