Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation-Reference-Cited by-同舟云学术

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Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation

Published:1991-11-01 Issue:6 Volume:3 Page:995-997
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Jain A.,Chi K. M.,Kodas T. T.,Hampden-Smith M. J.,Farr J. D.,Paffett M. F.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00018a005

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