Porous Membranes as Sacrificial Layers Enabling Conformal Chemical Vapor Deposition Involving Multiple Film-Forming Species-Reference-Cited by-同舟云学术

Porous Membranes as Sacrificial Layers Enabling Conformal Chemical Vapor Deposition Involving Multiple Film-Forming Species

Published:2020-10-30 Issue:45 Volume:12 Page:51016-51025
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Shima Kohei¹^ORCID,Funato Yuichi¹,Sato Noboru¹,Fukushima Yasuyuki²,Momose Takeshi¹,Shimogaki Yukihiro¹

Affiliation:

1. Department of Materials Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

2. Advanced Applied Science Department Research Laboratory, IHI Corporation, Isogo, Yokohama 235-8501, Japan

Funder

Ministry of Economy, Trade and Industry

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c14069

Reference50 articles.

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4. A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

5. Conformality in atomic layer deposition: Current status overview of analysis and modelling

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