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Atomic layer deposition of metals: Precursors and film growth

Published:2019-12 Issue:4 Volume:6 Page:041309
ISSN:1931-9401
Container-title:Applied Physics Reviews
language:en
Short-container-title:Applied Physics Reviews

Author:

Hagen D. J.¹²^ORCID,Pemble M. E.³^ORCID,Karppinen M.¹^ORCID

Affiliation:

1. Department of Chemistry and Materials Science, Aalto University, 02150 Espoo, Finland

2. NISE Department, Max Planck Institute of Microstructure Physics, 06120 Halle (Saale), Germany

3. School of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland

Funder

Science Foundation Ireland

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5087759

Reference361 articles.

1. A study of ZnTe films grown on glass substrates using an atomic layer evaporation method

2. In situ study of a strontium β-diketonate precursor for thin-film growth by atomic layer epitaxy

3. Properties of Cu(thd)2 as a Precursor to Prepare Cu/SiO2 Catalyst Using the Atomic Layer Epitaxy Technique

4. Atomic layer epitaxy (ALE) on porous substrates

5. Atomic Layer Epitaxy of Copper: Growth and Selectivity in the Cu(II)‐2,2,6,6‐tetramethyl‐3,5‐heptanedionate/ Process

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1. The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces;Surface Science;2024-11

2. Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements;Advanced Materials Interfaces;2024-08-23

3. Synthesis, characterization, volatility, and thermal stability of fluorinated copper(II) aminoalkoxide complexes as potential vapour deposition precursors;Canadian Journal of Chemistry;2024-08-20

4. Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction;Journal of Vacuum Science & Technology A;2024-06-25

5. The surface chemistry of the atomic layer deposition of metal thin films;Nanotechnology;2024-06-18

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