Link between Gas Phase Reaction Chemistry and the Electronic Conductivity of Atomic Layer Deposited Titanium Oxide Thin Films
Author:
Affiliation:
1. Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
Funder
National Science Foundation
Publisher
American Chemical Society (ACS)
Subject
General Materials Science,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpclett.1c00115
Reference53 articles.
1. Mistry, K.; Allen, C.; Auth, C.; Beattie, B.; Bergstrom, D.; Bost, M.; Brazier, M.; Buehler, M.; Cappellani, A.; Chau, R. A 45nm logic technology with high-k+metal gate transistors, strained silicon, 9 Cu interconnect layers, 193nm dry patterning, and 100% Pb-free packaging. International Electron Devices Meeting; IEEE, 2007; pp 247–250.
2. Cho, H.J.; Seo, K.I.; Jeong, W.; Kim, Y.H.; Lim, Y.; Jang, W.; Hong, J.; Suk, S.; Li, M.; Ryou, C. Bulk planar 20nm high-k/metal gate CMOS technology platform for low power and high performance applications. International Electron Devices Meeting; IEEE, 2011; pp 15.1.1–15.1.4.
3. Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation
4. Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
5. Catalyst Design with Atomic Layer Deposition
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Blocking layer of dark current for Si-based short-wave infrared photodetection;Applied Physics Letters;2024-09-02
2. Effects of Nd-doping on crystal phase, structure and photocatalytic performance of TiO2 powders prepared by sol-gel method;Physica Scripta;2024-08-27
3. Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing;Atomic Layer Deposition;2024-06-04
4. Photocatalytic degradation of methylene blue by Nd-doped titanium dioxide thin films;Nanotechnology Reviews;2024-01-01
5. O3-Annealing Effect on the Etching Resilience of a TiO2/Al2O3 filter Prepared by Atomic Layer Deposition;ACS Applied Materials & Interfaces;2023-08-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3