O3-Annealing Effect on the Etching Resilience of a TiO2/Al2O3 filter Prepared by Atomic Layer Deposition-Reference-Cited by-同舟云学术

O₃-Annealing Effect on the Etching Resilience of a TiO₂/Al₂O₃ filter Prepared by Atomic Layer Deposition

Published:2023-08-17 Issue:34 Volume:15 Page:40942-40953
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Vazquez Jorge Luis¹²^ORCID,López Javier³,Bohórquez Carolina¹²^ORCID,Lizarraga Eder⁴,Blanco Eduardo⁵^ORCID,Can-Uc Bonifacio²,Romo Oscar¹²,Nedev Nicola⁶,Farías Mario H.²,Tiznado Hugo²^ORCID

Affiliation:

1. Centro de Investigación Científica y de Educación Superior de Ensenada-CICESE. Ensenada 22860, México

2. Universidad Nacional Autónoma de México (UNAM), Centro de Nanociencias y Nanotecnología (CNyN), Km 107 Carretera Tijuana-Ensenada s/n, C.P. 22800, Ensenada 04510, Baja California, México

3. CONAHCYT - Centro de Nanociencias y Nanotecnología, UNAM, Km 107 Carretera Tijuana-Ensenada s/n., C.P. 22800, Ensenada 04510, México

4. Universidad Autónoma de Baja California, Unidad Valle de las Palmas, Blvd. Universitario 1000, C.P. 22260 Tijuana 22260, Baja California, México

5. Departamento de Física de la Materia Condensada, Universidad de Cádiz, E11519 Puerto Real, España

6. Universidad Autónoma de Baja California, Instituto de Ingeniería, Blvd. Benito Juárez s/n, C.P. 21280, Mexicali 21280, Baja California, México

Funder

Secretar?a de Energ?a de M?xico

Direcci?n General de Asuntos del Personal Acad?mico, Universidad Nacional Aut?noma de M?xico

Consejo Nacional de Ciencia y Tecnolog?a

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c07586

Reference67 articles.

1. Silicon Photonics Circuit Design: Methods, Tools and Challenges

2. Two‐Dimensional Materials for Integrated Photonics: Recent Advances and Future Challenges

3. Formation of Mach angle profiles during wet etching of silica and silicon nitride materials

4. The effect of KOH and KOH/IPA etching on the surface roughness of the silicon mold to be used for polymer waveguide imprinting

5. Laser damage thresholds of optical coatings

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