Focused Ion Beam vs Focused Electron Beam Deposition of Cobalt Silicide Nanostructures Using Single-Source Precursors: Implications for Nanoelectronic Gates, Interconnects, and Spintronics-Reference-Cited by-同舟云学术

Focused Ion Beam vs Focused Electron Beam Deposition of Cobalt Silicide Nanostructures Using Single-Source Precursors: Implications for Nanoelectronic Gates, Interconnects, and Spintronics

Published:2022-09-21 Issue:10 Volume:5 Page:14759-14770
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Jungwirth Felix¹^ORCID,Porrati Fabrizio¹^ORCID,Knez Daniel²^ORCID,Sistani Masiar³^ORCID,Plank Harald²⁴^ORCID,Huth Michael¹^ORCID,Barth Sven¹^ORCID

Affiliation:

1. Physikalisches Institut, Goethe Universität Frankfurt, 60438Frankfurt am Main, Germany

2. Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010Graz, Austria

3. Institute of Solid State Electronics, TU Wien, Gußhausstraße 25-25a, 1040Vienna, Austria

4. Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010Graz, Austria

Funder

Deutsche Forschungsgemeinschaft

European Cooperation in Science and Technology

Christian Doppler Forschungsgesellschaft

Horizon 2020 Framework Programme

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.2c03074

Reference64 articles.