Nanoscale, surface-confined phase separation by electron beam induced oxidation

Author:

Barth Sven12ORCID,Porrati Fabrizio1ORCID,Knez Daniel3ORCID,Jungwirth Felix12ORCID,Jochmann Nicolas P.12ORCID,Huth Michael1ORCID,Winkler Robert4ORCID,Plank Harald34ORCID,Gracia Isabel5,Cané Carles5

Affiliation:

1. Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany

2. Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany

3. Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria

4. Christian Doppler Laboratory for Direct–Write Fabrication of 3D Nano–Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria

5. Institut de Microelectrònica de Barcelona (IMB), Centre Nacional de Microelectrònica (CNM), Consejo Superior de Investigaciones Científicas (CSIC), 08193 Barcelona, Spain

Abstract

Electron-assisted oxidation of Co–Si-based focused electron beam induced deposition (FEBID) materials is shown to form an oxide bilayer with a total thickness of less than 15 nm by phase separation.

Funder

Deutsche Forschungsgemeinschaft

Ministerio de Ciencia e Innovación

Horizon 2020 Framework Programme

Bundesministerium für Digitalisierung und Wirtschaftsstandort

Publisher

Royal Society of Chemistry (RSC)

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