Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2

Author:

Merkx Marc J. M.1ORCID,Sandoval Tania E.2,Hausmann Dennis M.3,Kessels Wilhelmus M. M.1ORCID,Mackus Adriaan J. M.1ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, Eindhoven 5600 MB, The Netherlands

2. Department of Chemical and Environmental Engineering, Universidad Técnica Federico Santa María, Santiago 2340000, Chile

3. Lam Research Corporation, Portland, Oregon 97062, United States

Funder

Fondo Nacional de Desarrollo Cient?fico y Tecnol?gico

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Reference76 articles.

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3. Pan, D. Z.; Liebmann, L.; Yu, B.; Xu, X.; Lin, Y. Pushing Multiple Patterning in Sub-10nm. Proceedings of the 52nd Annual Design Automation Conference on—DAC 15, 2015; pp 1–6.

4. Mulkens, J.; Hanna, M.; Slachter, B.; Tel, W.; Kubis, M.; Maslow, M.; Spence, C.; Timoshkov, V. Patterning Control Strategies for Minimum Edge Placement Error in Logic Devices. Metrology, Inspection, and Process Control for Microlithography XXXI, 2017; Vol. 10145, p 1014505.

5. Yildirim, O.; Buitrago, E.; Hoefnagels, R.; Meeuwissen, M.; Wuister, S.; Rispens, G.; van Oosten, A.; Derks, P.; Finders, J.; Vockenhuber, M.; Ekinci, Y. Improvements in Resist Performance towards EUV HVM. Extreme Ultraviolet (EUV) Lithography VIII, 2017; Vol. 10143, p 101430Q.

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