A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers-Reference-Cited by-同舟云学术

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A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers

Published:2016-12-12 Issue:24 Volume:28 Page:8951-8961
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Blachut Gregory¹^ORCID,Sirard Stephen M.²,Maher Michael J.³,Asano Yusuke³,Someya Yasunobu³,Lane Austin P.¹,Durand William J.¹,Bates Christopher M.,Dinhobl Andrew M.¹,Gronheid Roel⁴,Hymes Diane²,Ellison Christopher J.¹³,Willson C. Grant¹³^ORCID

Affiliation:

1. McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States

2. Lam Research Corporation, 4400 Cushing Parkway, Fremont, California 94538, United States

3. Department of Chemistry, The University of Texas at Austin, Austin, Texas 78712, United States

4. imec, Kapeldreef 75, 3001 Heverlee, Belgium

Funder

Welch Foundation

International Business Machines Corporation

Army Research Office

University of California, Santa Barbara

Division of Engineering Education and Centers

Division of Electrical, Communications and Cyber Systems

Lam Research Corporation

Association of Science-Technology Centers

Board of Regents, University of Texas System

Nissan Chemical Industries, Ltd

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.6b03633

Reference59 articles.

1. Lithography and Other Patterning Techniques for Future Electronics

2. A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling

3. Improved cost-effectiveness of the block co-polymer anneal process for DSA

4. Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

5. Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy

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4. Synthesis and Self-assembly of Silicon-containing Block Copolymers for Sub 5 nm Nanolithography;ACTA POLYM SIN;2022

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