Mechanism of Thermal Al2O3 Atomic Layer Etching Using Sequential Reactions with Sn(acac)2 and HF
Author:
Affiliation:
1. Department of Chemistry and Biochemistry and‡Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States
Funder
Division of Chemistry
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.5b00300
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